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High-resolution lithography for nanoporous thin films

High-resolution lithography for nanoporous thin films
Direct X-ray and e-beam lithography of MOF films. Credit: KU Leuven

Researchers at KU Leuven (Belgium) developed a high-resolution lithography process to pattern metal-organic framework (MOF) films. This work, published in Nature Materials, will speed up the integration of these materials into microchips.


Metal-organic frameworks (MOFs) are molecular sponges that consist of organic molecules and metal ions. “There is a bright future for these materials in high-tech miniaturized devices such as low-power processors, resistive memory, sensors, and flexible electronics,” says Professor Rob Ameloot from the KU Leuven Centre for Membrane Separations, Adsorption, Catalysis, and Spectroscopy (cMACS). “Both the MOF and microelectronics communities have been striving towards integrating MOFs in microchips, which requires two key engineering steps: thin film deposition and lithographic patterning.”

In 2016, the group of Professor Ameloot developed chemical vapor deposition of MOF thin films, a method compatible with industrial chip fabrication. Now, the team takes one

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